On the growth kinetics, texture, microstructure, and mechanical properties of tungsten carbonitride deposited by chemical vapor deposition

Tungsten carbonitride [W(C,N)] was deposited on cemented carbide substrates by chemical vapor deposition (CVD) in a hot-wall reactor using tungsten hexafluoride (WF6), acetonitrile (CH3CN), and hydrogen (H2) as precursors. carbides nitrides with hexagonal δ-WC type structure are generally difficult to obtain CVD. Here, it found that the combination of WF6 CH3CN precursors enabled W(C,N) coatings columnar grains. A process window function temperature precursor partial pressures determined establish conditions for such coatings. Scanning electron microscopy, x-ray diffraction, backscatter elastic recoil detection analysis were used investigation coating thickness, microstructure, texture, composition. From kinetics, concluded growth mainly controlled surface kinetics an apparent activation energy 77 kJ/mol, yielding excellent step coverage. The reaction orders reactants together their influence microstructure composition further gain deeper understanding mechanism. Within window, texture could be tailored parameters, enabling microstructural engineering tuning mechanical properties nanoindentation hardness (36.6–45.7 GPa) modulus (564–761 closely related microstructure.